AI Summary

Miami‑based NAED Energy Holding announced its PV‑1 PECVD‑V deposition platform can process 96,000 wafers per hour, twice the 48,000 wafers per hour of its earlier XL‑class line. The vertical in‑line system merges plasma‑enhanced chemical vapor deposition and physical vapor deposition on a single shared‑carrier line. Wafers remain upright as they move through each stage, and to expose the opposite side the entire carrier is lifted and rotated 180°, eliminating individual wafer flipping. This design is said to reduce direct wafer handling between process steps.

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