Summary

Researchers at Kanazawa University, in collaboration with Diamond and Carbon Applications (Germany), have developed a buried-growth process for nitrogen–vacancy (NV) centers in diamond using microwave plasma chemical vapor deposition (MPCVD). By employing nitrogen-radical selective etching, which simultaneously enhances metal-mask durability through nitridation, the team enabled a continuous etching–growth sequence within a single MPCVD process.

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