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'Flawless on the outside, flipped within': Detecting hidden defects in 2D dielectrics with light
A material may appear flawless on the surface yet fail to function properly. The cause lies in structural defects hidden within two-dimensional thin films, which are considered key materials for next-generation semiconductor devices.
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A Korean research team has created an optical method to spot hidden structural defects in two‑dimensional thin films that appear flawless on the surface. Using interferometric second‑harmonic generation imaging, the technique can detect imperfections inside hexagonal boron nitride (hBN) layers, a material sought for next‑generation semiconductor devices. The study, led by Professor Sunmin Ryu and Ph.D. candidate Yeri Lee at Pohang University of Science and Technology, was published in Advanced Materials.
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